MKS AX7695 Remote RF Plasma Source

The MKS AX7695 remote radio frequency plasma source is an advanced device based on the principle of electromagnetic coupling that can generate radio frequency energy to excite the gas in the internal cavity of the product into plasma. This plasma can be input into the user's vacuum chamber and participate in various process reactions.

A special feature of a remote plasma source is that it exists independently of the user's vacuum chamber. After diffusion and transportation, the generated plasma mainly participates in the process reactions in the user cavity in the form of free radicals. Compared with the plasma dominated by ions and electrons generated directly in the user cavity, the participation of plasma dominated by free radicals in process reactions can reduce the physical damage and heat load caused by ion bombardment to the process object. Therefore, the MKS AX7695 remote RF plasma source is ideal for processes where ion bombardment and high thermal loads need to be avoided.

This equipment is usually used for surface treatment, material modification, film deposition and other processes in vacuum chambers. It can also be used for molecular-level cleaning of process chambers. In addition to semiconductor-related applications, the MKS AX7695 remote radio frequency plasma source can also be widely used in new materials, new energy, environmental science, biomedicine and other fields.